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CMOS反向器版图 (2)

作者:未知   时间:2005-12-19 12:14:17  来自:网上转载  浏览次数:3133  文字大小:【】【】【

  • NMOS

Drawing the N-Diffusion (Active)


 

Now we will start drawing our first transistor. which will be the NMOS transistor of the CMOS inverter. From the schematic, we know that this transistor has a channel width of 1.2u. The width of the transistor will correspond to the width of the active area. We will select the n-diffusion layer and draw a rectangular active area to define the transistor.

1. Select nactive layer from the LSW

 

nactive

 

2. From the Create menu in Virtuoso select Rectangle
( Create --> Rectangle )

 

Menu

3. Draw the box

 

You are now in rectangle mode. Select the first corner of rectangle in the layout window (you may select any point within the window but try to select a point close to the origin), click once, and then move the mouse cursor to the opposite corner. Using the information bar, draw a box that is 3.6u horizontal and 1.2u vertical. All units are in micrometers by default. To simplify the drawing, a grid of half a lambda is used, that is the cursor moves in 0.15u increments only.

Diffusion


 

The Gate Poly


 

The second step is to draw the gate. We will use a vertical polysilicon rectangle to create the channel. Note that the length of the transistor channel will be determined by the width of this poly rectangle.

1. Select poly layer from the LSW

 

poly

 

2. From the menu Misc choose Ruler
( Misc --> Ruler )

menu

The ruler is a very handy function. In our case we need to draw the poly rectangle in the middle of the diffusion region. Furthermore, design rules tell us that poly must extend at least by 0.6u (2 Lambda) from edge of the diffusion . To pinpoint the location of the poly gate we can use two rulers. One ruler will be used to determine the horizontal distance of the poly gate from the diffusion edge, while a second ruler will show the minimum amount of poly extension outside the diffusion according to the design rules

3. Draw poly rectangle

poly

The starting point is pinpointed by two rulers. The rectangle function is used to draw a poly rectangle that is 0.6u

Making Active Contacts


 

The next step is to make the active contacts. These contacts will provide access to the drain and source regions of the NMOS transistor.

1. Select the ca (Active Contact) layer from the LSW.

contact

2. Use the ruler to pinpoint a location 0.30u from the edges of diffusion.

3. Create a square with a width and height of 0.6u within the active area.

First contact

4. From the Edit menu choose Copy
( Edit --> Copy )

menu

You could choose to draw the second contact the same way as you have drawn the first one. However, copying existing features is also a viable alternative.

The copy dialog box will pop-up as soon as you select the copying mode. For this operation the default values are appropriate. The Snap Mode is an interesting option. When this is in orthogonal setting the copied objects will move only along one axis. This is a good feature to help you avoid alignment problems.

copy options

5. Copy the contact

After you enter the copy mode, an object must be selected. Click in the contact, you'll notice that the outline of contact will attach to your cursor. Now move the object, and click when you are satisfied with the location.

copying contact

Design rules state that the minimum contact to poly spacing must be 0.6u (2 lambda). You can use a ruler to pinpoint the location. Please note that you can interrupt any mode for placing a ruler (and zooming in and out). After you are finished (by hitting "ESC" key) you'll return to the mode you were in.

Contacts placed

Now you have placed an active contact each into the source and drain diffusion regions of the transistor.

Covering Contacts with Metal-1


 

Active contacts in fact only define holes in the oxide (connection terminals). The actual connection to the corresponding diffusion region is made by the Metal layer.

1. Select layer Metal-1 from the LSW

Metal-1

2. Draw two rectangles 1.2u wide to cover the contacts

Metal-1 on Contacts

The N-Select Layer


 

Each diffusion area of each transistor must be selected as being of n-type or p-type. This is accomplished by a defining the "window: of n-type (or p-type) doping (implantation), through a special mask layer called n-select (p-select).

1. Select nselect layer from the CIW.

 

n select

2. Draw a rectangle extending over the active area by 0.6u (2 lambda) in all directions.

N select

This is it ! Our first transistor is finished, now let us make a few million more of the same :-)

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责任编辑:5life

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